Search results

This paper aims to study the wear properties of electron beam melted Ti6Al4V (EBM-Ti6Al4V) in simulated body fluids for orthopedic implant biomedical applications compared with wrought Ti6Al4V (Wr-Ti6Al4V).

Wear properties of EBM-Ti6Al4V compared with Wr-Ti6Al4V against ZrO₂ and Al₂O₃ have been investigated under dry friction and the 25 Wt.% newborn calf serum (NCS) lubricated condition using a ball-on-disc apparatus reciprocating motion. The microstructure, composition and hardness of the samples were characterized using scanning electron microscopy (SEM), x-ray diffraction and a hardness tester, respectively. The contact angles with 25 Wt.% NCS were measured by a contact angle apparatus. The wear parameters, wear 2D and 3D morphology were obtained using a 3D white light interferometer and SEM.

EBM-Ti6Al4V yields a higher contact angle than the Wr-Ti6Al4V with the 25 Wt.% NCS. EBM-Ti6Al4V couplings exhibit lower coefficients of friction compared with the Wr-Ti6Al4V couplings under both conditions. There is only a slight difference in the wear resistance between the Wr-Ti6Al4V and EBM-Ti6Al4V alloys. Both Wr-Ti6Al4V and EBM-Ti6Al4V suffer from similar friction and wear mechanisms, i.e. adhesive and abrasive wear in dry friction, while abrasive wear under the NCS condition. The wear depth and wear volume of the ZrO₂ couplings are lower than those of the Al₂O₃ couplings under both conditions.

This paper helps to establish baseline bio-tribological data of additively manufactured Ti6Al4V by electron beam melting in simulated body fluids for orthopedic applications, which will promote the application of additive manufacturing in producing the orthopedic implant.

The wear of an abrasive single-crystal diamond (SCD) grit affects the machining quality of the sapphire wafer. This paper aims to investigate the influence of crystallographic orientation on the wear characteristics of SCD grit scratching on sapphire.

The wear characteristics of two SCD grits (SCD100 and SCD111) with different crystallographic orientations were systematically investigated. The wear mechanism involved in the scratching process was explored. The wear morphology, scratching forces and friction coefficient during the scratching process were measured and analyzed.

The experiment results show that the wear progress of the two SCD grits is obviously different. The wear resistance of SCD111 grit is greater than that of SCD100 grit in normal wear stage. However, the SCD100 grit could remove more sapphire material than SCD111 grit. The SCD grits mainly sustain extrusion stress and shear stress during scratching on sapphire. The crystallographic orientation of SCD grits plays a significant role in the wear progress during scratching on sapphire.

The results of the experimental studies could provide a theoretical foundation for improving the fabrication of abrasive diamond tools.